SemiAnalysis· @SemiAnalysis_ · X·· 3 小时前AI 评分25
AI 导读
在 Semicon Taiwan 上，EVG 介绍了纳米压印光刻（NIL）在光子集成电路大规模制造以及激光器制造中的应用。NIL 特别适合在光子芯片内定义周期性结构，例如光栅耦合器，或用于微发射器阵列的微透镜阵列，并有可能用于 DFB 激光器光栅。(1/3)🧵
正文
In Semicon Taiwan, EVG had described the use of Nano-Imprint Lithography (NIL) in the mass manufacture of Photonic Integrated Circuits and for laser manufacturing. NIL is especially useful to define periodic structures within a photonic chip such as grating couplers or microlens arrays for microemitter arrays and potentially for DFB laser gratings. (1/3)🧵
来源：SemiAnalysis · x.com