According to Liberation Daily, Landau Suiyan showcased China's most advanced publicly displayed EUV light-source prototype at the China International Industry Fair (CIIF).

The prototype features a 90% domestic content ratio, with most core components developed in-house. Built on the same technical architecture as global industry leaders, the system is ready for chip exposure testing.

As one of the three core components for sub-7nm chip manufacturing, EUV light sources have long been subject to foreign monopolies and export controls—making them a critical bottleneck for China's chip self-reliance.

Could this signal an imminent breakthrough?